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INTERNATIONAL JOURNAL OF ENGINEERING DEVELOPMENT AND RESEARCH
(International Peer Reviewed,Refereed, Indexed, Citation Open Access Journal)
ISSN: 2321-9939 | ESTD Year: 2013

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Paper Title
Morphology Evaluation of TiO2 Dip Coating on Mild Steel and Enhancing Its Surface Roughness
Authors
  Mohd Abdul Malik,  Dr S. Murali,  D. Santhosh

Abstract
Now a day, steel has become an important part of our life due to its extensive applications in automotive, household appliances, business machine and heavy construction such as marine and chemical industries. TiO2 nanoparticles are odorless and nontoxic. They possess high hardness, high purity and a high melting point. It is the popular material used in the applications automotive, aerospace, sports equipment, and electronics industries. For this study, Titanium isopropoxide: (C12H28O4Ti) And Ethanol: (C2H6O) 50 ml are used as a starting material for the preparation of TiO2nanoparticles by sol gel process and size was found to be 55 nm from X-ray diffraction. Plate samples of 10x15x2 mm is the substrates were fully immersed in titanium tetrachloride solution and air dried for another 2 minutes. These steps were repeated according to the number of coatings of each substrate. The substrate then annealed at 500oC for two hours in the muffle furnace. Shows better surface roughness on coated samples at 500˚C. Coated samples are characterized by XRD, SEM and Surface Roughness.

Keywords- TiO2, Surface Roughness, XRD, SEM and EDX
Publication Details
Unique Identification Number - IJEDR2001019
Page Number(s) - 98-102
Pubished in - Volume 8 | Issue 1 | January 2020
DOI (Digital Object Identifier) -   
Publisher - IJEDR (ISSN - 2321-9939)
Cite this Article
  Mohd Abdul Malik,  Dr S. Murali,  D. Santhosh,   "Morphology Evaluation of TiO2 Dip Coating on Mild Steel and Enhancing Its Surface Roughness", International Journal of Engineering Development and Research (IJEDR), ISSN:2321-9939, Volume.8, Issue 1, pp.98-102, January 2020, Available at :http://www.ijedr.org/papers/IJEDR2001019.pdf
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